ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
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Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Principle and recommendations of MEIS analysis
5 MEIS analysis
6 MEIS spectra simulation
7 Reporting MEIS analysis results
Annex A (informative) Interlaboratory test report
Annex B (informative) List of MEIS spectra simulation program sources and a procedure of MEIS spectra simulation using PowerMeis
Annex C (informative) Reliability of the IAEA electronic stopping power data
Annex D (informative) Fitting parameters A, B, C, D from the IAEA database
Bibliography
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Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Principle and recommendations of MEIS analysis
5 MEIS analysis
6 MEIS spectra simulation
7 Reporting MEIS analysis results
Annex A (informative) Interlaboratory test report
Annex B (informative) List of MEIS spectra simulation program sources and a procedure of MEIS spectra simulation using PowerMeis
Annex C (informative) Reliability of the IAEA electronic stopping power data
Annex D (informative) Fitting parameters A, B, C, D from the IAEA database
Bibliography