ISO 21859:2019
Current
Date published:
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
| Get this standard | Prices exclude GST | |
|---|---|---|
| PDF ( Single user document) |
$79.13 NZD
|
|
| Networkable PDF |
Price varies
|
Keep me up-to-date
Register to receive notifications when updates are made to this standard.
Related Information
81.060.30 Advanced ceramics
Similar Standards
-
BS 7134-0:1989
Testing of engineering ceramics, Introduction and guide to sampling
-
BS EN 1006:2009
Advanced technical ceramics. Monolithic ceramics. Guidance on the selection of test pieces for the evaluation of properties
-
BS EN 1007-1:2002
Advanced technical ceramics. Ceramic composites. Methods of test for reinforcements, Determination of size content
-
BS EN 1007-2:2002
Advanced technical ceramics. Ceramic composites. Methods of test for reinforcements, Determination of linear density
ISO 21859:2019
Get this standard
Prices exclude GST
PDF
( Single user document)
$79.13 NZD
Networkable PDF
Price varies