ISO/TR 20580:2022
Preparation of metallographic specimens
This document presents a list of common practices in preparation methods of metallographic specimens for optical and scanning electron microscopy, including preliminary preparation, grinding and polishing of specimens as well as microstructure revelation methods covering the optical method, etching methods (chemical, electrolytic, constant potential, ion sputtering and high temperature relieving) and the interface layer method [1][2].
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Foreword
1 Scope
2 Normative references
3 Terms and definitions
4 Preliminary preparation
4.1 Selection of metallographic specimens
4.1.1 General
4.1.2 General studies or routine work
4.1.3 Study of failures
4.2 Selection of type of section to be examined
4.3 Size of metallographic specimens
4.4 Cutting of metallographic specimens
4.5 Marking of metallographic specimens
4.6 Cleaning
4.7 Mounting
4.7.1 General
4.7.2 Mechanical mounting
4.7.3 Plastic mounting:
5 Grinding
5.1 Planar or rough grinding
5.2 Fine grinding
5.2.1 General
5.2.2 Manual methods
5.2.3 Automated methods
6 Polishing
6.1 General
6.2 Mechanical polishing
6.2.1 Rough polishing
6.2.2 Fine polishing
6.3 Electrolytic polishing
6.4 Chemical polishing
6.5 Vibratory polishing
7 Microstructure revelation
7.1 General
7.2 Optical method
7.3 Etching method
7.3.1 Chemical etching [13]
7.3.2 Electrolytic etching [21]
7.3.3 Constant potential etching
7.3.4 Ion sputtering etching (cathode vacuum etching)
7.3.5 High temperature relieving etching
7.4 Interference layer method
Annex A (informative) Etchants for metals
Bibliography
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Foreword
1 Scope
2 Normative references
3 Terms and definitions
4 Preliminary preparation
4.1 Selection of metallographic specimens
4.1.1 General
4.1.2 General studies or routine work
4.1.3 Study of failures
4.2 Selection of type of section to be examined
4.3 Size of metallographic specimens
4.4 Cutting of metallographic specimens
4.5 Marking of metallographic specimens
4.6 Cleaning
4.7 Mounting
4.7.1 General
4.7.2 Mechanical mounting
4.7.3 Plastic mounting:
5 Grinding
5.1 Planar or rough grinding
5.2 Fine grinding
5.2.1 General
5.2.2 Manual methods
5.2.3 Automated methods
6 Polishing
6.1 General
6.2 Mechanical polishing
6.2.1 Rough polishing
6.2.2 Fine polishing
6.3 Electrolytic polishing
6.4 Chemical polishing
6.5 Vibratory polishing
7 Microstructure revelation
7.1 General
7.2 Optical method
7.3 Etching method
7.3.1 Chemical etching [13]
7.3.2 Electrolytic etching [21]
7.3.3 Constant potential etching
7.3.4 Ion sputtering etching (cathode vacuum etching)
7.3.5 High temperature relieving etching
7.4 Interference layer method
Annex A (informative) Etchants for metals
Bibliography