ISO 16531:2020
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.
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Foreword
Introduction
1 Scope
2 Normative references
3 Terms, definitions, symbols and abbreviated terms
4 System requirements
4.1 General
4.2 Limitations
5 Ion beam alignment methods
5.1 General
5.2 Important issues to be considered prior to ion beam alignment
5.3 Alignment using circular-aperture Faraday cup
5.4 Alignment using elliptical-aperture Faraday cup
5.5 Alignment using images from ion-induced secondary electrons during ion beam rastering
5.6 Alignment in X-ray photoelectron microscope/photoelectron imaging system
5.7 Alignment by observing direct ion beam spot or crater image during and after ion sputtering
5.8 Alignment by observing phosphor sample
6 When to align and check ion beam alignment
Annex A (informative) Comparison of AES depth profiles with good/poor ion beam alignment
Annex B (informative) Alignment using cup with co-axial electrodes
Bibliography
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Foreword
Introduction
1 Scope
2 Normative references
3 Terms, definitions, symbols and abbreviated terms
4 System requirements
4.1 General
4.2 Limitations
5 Ion beam alignment methods
5.1 General
5.2 Important issues to be considered prior to ion beam alignment
5.3 Alignment using circular-aperture Faraday cup
5.4 Alignment using elliptical-aperture Faraday cup
5.5 Alignment using images from ion-induced secondary electrons during ion beam rastering
5.6 Alignment in X-ray photoelectron microscope/photoelectron imaging system
5.7 Alignment by observing direct ion beam spot or crater image during and after ion sputtering
5.8 Alignment by observing phosphor sample
6 When to align and check ion beam alignment
Annex A (informative) Comparison of AES depth profiles with good/poor ion beam alignment
Annex B (informative) Alignment using cup with co-axial electrodes
Bibliography